Modern photolithography machines must deliver extraordinary precision on a repeatable basis, and in high volume production. In response to demands for increased throughput in the semiconductor ...
IMEC has successfully demonstrated the full wafer-scale fabrication of nanopores using ASML’s state-of-the-art extreme ...
Researchers at the National Institute of Standards and Technology (NIST) have devised a system for manipulating and precisely positioning individual nanowires Researchers at the National Institute of ...
Dutch company ASML has pulled the wraps off its next-generation high-NA (numerical aperture) lithography machine, giving the press a unique look under the hood of the most advanced chip-making machine ...
Advanced machine learning is beginning to make inroads into yield enhancement methodology as fabs and equipment makers seek to identify defectivity patterns in wafer images with greater accuracy and ...